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SC-W1 Wafer Cleaning

Specifically designed for cleaning micro-dust on the surface of wafers or glass substrates after cutting.
Product details
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    Cleaning process: dual-fluid cleaning (can be set in segments) -centrifugal drying.

    HighSpeed centrifugal dehydration ensures no water marks or residues on the surface of the workpiece

    Equipped with an anti-static ion wind system.

    Equipped with an air filtration system, ensuring cleaner compressed air.

    The overall stainless steel mirror body is sturdy and durable, resistant to acidic and alkaline cleaning fluids.

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Address:
ROOM 716A,BUILDING B,FAR EAST INTERNATIONAL PLAZA,NO.317 XIANXIA ROAD,CHANGNING DISTRUCT,SHANGHAI.CHINA
Contact: Sales Manager
Mobile:86-15800879812(Sales Manager)
Email:qi@sawach.cn
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